Plasma Assisted Deposition Technology of Optical Coating

Abstract:

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Plasma assisted deposition technology with an advanced plasma source and its application in the field of optical coating fabrication are investigated. In this paper, MgF2, Al2O3 and TiO2 single layer films are prepared by this technology, and the measure results show that they all have good optical parameter.

Info:

Periodical:

Edited by:

Honghua Tan

Pages:

463-467

DOI:

10.4028/www.scientific.net/AMM.29-32.463

Citation:

X. H. Rong et al., "Plasma Assisted Deposition Technology of Optical Coating", Applied Mechanics and Materials, Vols. 29-32, pp. 463-467, 2010

Online since:

August 2010

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Price:

$35.00

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