Optical Transmittance and Band Gap of Electrodeposited Cu2O/ITO Layers

Abstract:

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Cuprous oxide films are successfully electrodeposited through the reduction of cupric ions in alkaline and acid electrolytes. The effect of electrodeposition parameters on the optical band gaps of Cu2O films is investigated using UV-vis spectroscopy. It is found that the optical transmittances and the band gaps of the Cu2O thin films are strongly influenced by the electrodeposition bath, the temperature, the current density, and the pH value. The band gaps are varied from 1.80 eV to 2.43 eV with different electrodeposition parameters.

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Periodical:

Edited by:

Shengyi Li, Yingchun Liu, Rongbo Zhu, Hongguang Li, Wensi Ding

Pages:

1421-1424

DOI:

10.4028/www.scientific.net/AMM.34-35.1421

Citation:

F. Hu et al., "Optical Transmittance and Band Gap of Electrodeposited Cu2O/ITO Layers", Applied Mechanics and Materials, Vols. 34-35, pp. 1421-1424, 2010

Online since:

October 2010

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$35.00

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