Influential Factors on Microstructure of LaB6 Films

Jing Xu

doi:10.4028/www.scientific.net/AMM.385-386.3

Paper Titles

Preface and Organizzing Committee

Influential Factors on Microstructure of LaB₆ Films
p.3

Research on Structural Properties of FePt: C Thin Films with FePt Underlayers
p.7

Effect of UV Radiation on Different Voltage Grade of HTV-Silicon Rubber in Dry Conditions Performance
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Hydrothermal Synthesis of Zn₂(MoO₄)(SeO₃) and Photocatalytic Applications
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Numerical Simulation of the Plasma-Assisted Combustion of Methane HCCI
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Effect of Growth Temperature on Thin Films Structure and Blue Photoluminescence Spectrum of Nanocrystalline ZnO Films
p.23

Discussion and Improvement of Carburizing Defects
p.27

Recovering of Iron from Feebly-Magnetic Iron Tailings Containing High Silicate
p.30

HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 385-386Influential Factors on Microstructure of LaB6...

Influential Factors on Microstructure of LaB₆ Films

Abstract:

LaB₆ films are deposited by magnetron sputtering deposition. ZrO₂ glass is used as substrate. Bias voltage and substrate temperature are adjusted. Morphology of films that deposited at different parameters is characterized by AFM. Results of AFM shows that grains diameter on surface of LaB₆ films is nanoscale, and roughness of the surface is less than 20nm. LaB₆ crystallites are seen to cover substrate surface entirely. Structure of films is smooth and compactness, and there is no obviously default is found. Bias-voltage influences morphologies of films more obviously than substrate. The best bias voltage is-100V. Structure of film that deposited at 450°C is more compactness than others, and roughness of the film is least.

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Periodical:

Applied Mechanics and Materials (Volumes 385-386)

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3-6

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.385-386.3

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Online since:

August 2013

Authors:

Jing Xu

Keywords:

Bias Voltage, LaB₆ Film, Morpholoy, Substrate Temperature

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