Characteristic Analysis of Plasma Arc Adjusted by a Magnetic Field

Abstract:

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The image collecting devices, which consist of optical lens, neutral density filter, narrow-band interference filter, CCD and the other equipments are set up to collect the images of plasma arc column with and without external transverse alternating magnetic field (ETAMF). On the basis of de-noising and enhancing morphological characteristics to the collected images, the characteristics of plasma arc with and without ETAMF are analyzed comparatively. The results show that the application of ETAMF is capable to get oscillation of plasma arc, and change its location, shape and heat flux density distribution, which can get efficiently control in the width of heated area and flatten heat flux density of workpiece surface.

Info:

Periodical:

Edited by:

Ran Chen

Pages:

1812-1816

DOI:

10.4028/www.scientific.net/AMM.44-47.1812

Citation:

J. Sun et al., "Characteristic Analysis of Plasma Arc Adjusted by a Magnetic Field", Applied Mechanics and Materials, Vols. 44-47, pp. 1812-1816, 2011

Online since:

December 2010

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Price:

$35.00

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