Characteristic Analysis of Plasma Arc Adjusted by a Magnetic Field

Jing Sun; Wen Ji Xu; Chun Yan Wang

doi:10.4028/www.scientific.net/AMM.44-47.1812

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 44-47Characteristic Analysis of Plasma Arc Adjusted by...

Characteristic Analysis of Plasma Arc Adjusted by a Magnetic Field

Abstract:

The image collecting devices, which consist of optical lens, neutral density filter, narrow-band interference filter, CCD and the other equipments are set up to collect the images of plasma arc column with and without external transverse alternating magnetic field (ETAMF). On the basis of de-noising and enhancing morphological characteristics to the collected images, the characteristics of plasma arc with and without ETAMF are analyzed comparatively. The results show that the application of ETAMF is capable to get oscillation of plasma arc, and change its location, shape and heat flux density distribution, which can get efficiently control in the width of heated area and flatten heat flux density of workpiece surface.

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Periodical:

Applied Mechanics and Materials (Volumes 44-47)

Pages:

1812-1816

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.44-47.1812

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Online since:

December 2010

Authors:

Jing Sun, Wen Ji Xu, Chun Yan Wang

Keywords:

External Transverse Alternating Magnetic Field (ETAMF), Heat Flux Density Distribution, Image Collection System, Plasma Arc

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