Effects of Substrate Temperature on Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

Xing Fa Zi; Wen Yang; Peng Zhi Yang; Rui Ming Liu; Xin Zhu Shu

doi:10.4028/www.scientific.net/AMM.540.25

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 540Effects of Substrate Temperature on Structure and...

Effects of Substrate Temperature on Structure and Optical Property of Cu₂O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

Abstract:

N-doped Cu₂O (Cu₂O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target in a mixture of N₂、O₂ and Ar atmosphere. Effect of substrate temperature on structure, surface morphology and optical properties of thin films were investigated by XRD, AFM and UV-Vis spectroscopy. The results showed that the single-phase of Cu₂O(111) thin films were grown for substrate temperature < 200°C. The thin films deposited under different substrate temperatures are characteristics of 2D growth. Moreover,the optical band gap E_g of thin film was in the range 2.54-2.58eV, and slightly decreased with increasing of substrate temperatures from RT to 400°C.

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Periodical:

Applied Mechanics and Materials (Volume 540)

Pages:

25-29

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.540.25

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Online since:

April 2014

Authors:

Xing Fa Zi, Wen Yang, Peng Zhi Yang, Rui Ming Liu, Xin Zhu Shu

Keywords:

Cu₂O Thin Film, Pulse Magnetron Sputtering, Structure, Substrate Temperature

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