Research of Mask Image’s Generation Based on STL Model for Integral Stereolithography System

Guang Shen Xu; Ya Ning Wang; Kuang Kuang Jin

doi:10.4028/www.scientific.net/AMM.540.468

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 540Research of Mask Image’s Generation Based on STL...

Research of Mask Image’s Generation Based on STL Model for Integral Stereolithography System

Abstract:

To solve the problem that generation of mask image based on STL model for integral Stereolithography System, a novel method that can generate mask image based on STL model for integral Stereolithography System is proposed. Firstly, contour data is obtained with STL model slicing software; then properties of contour loop’s internal and external are determined; and then the order of contour loop’s filling is determined; Lastly, the contour loop is filled with the order, and mask image based on STL model can be produced. Generation of mask image is implemented with VC++6.0. The verification result indicates that this method can fill multiple nested contour loops correctly and generate correct mask image for integral Stereolithography System.