Fabrication of Multi-Scale Grid Patterns as Deformation Carriers in Optical Methods

Abstract:

Multi-scale grid is an essential deformation carrier in optical methods for multi-scale deformation measurement. In this study, several new-type multi-scale grids were designed and fabricated by electron beam lithography. Each pattern includes several periodically distributed dots with the same spacing but different sizes. As a consequence, the grayscale of the whole grid pattern periodically changes. The peak parts of the grayscale generate a secondary grid, i.e., the large-scale grid. The ratio of the large-scale grid pitch to the small-scale grid pitch can be easily adjusted according to the requirement. The natural integration between the small-scale grid and the large-scale grid works well in eliminating the mutual disturbance between the different-scale grids. Besides, this type of grid has a very high success rate in fabrication owing to the small differences in size between the big dots and the small dots. The proposed multi-scale grid pattern is expected to serve as the deformation carrier in moiré methods and geometric phase analysis for multi-scale deformation measurement.

• Periodical: Applied Mechanics and Materials (Volume 782)
• Pages: 271-277
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.782.271
• Online since: August 2015
• Authors: Qing Hua Wang*, Shi En Ri, Hiroshi Tsuda, Satoshi Kishimoto, Yoshihisa Tanaka, Yutaka Kagawa
• Keywords: Deformation, Electron Beam Lithography, Grid, Micron, Multi-Scale, Submicron

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