Analysis of Polycrystalline Silicon-Photovoltaic Industry’s Key Technologies Development and Influences on its Cost and Energy-Consumption

Abstract:

Polycrystalline silicon-photovoltaic industry belongs to high-and-new technology industry, but it produces massive by-products (silicon tetrachloride and so on), even partial chloro-silicane and hydrogen chloride exude into the exhaust in its production process. As a consequence, it not only increases the exhaust processing cost in the polycrystalline silicon-photovoltaic industry, but also increases pollutant discharge of the enterprise. At present, Chinese polycrystalline silicon-photovoltaic enterprises cannot solve technical difficult problems in large-scale production due to lack of coordination of chemical industry. Moreover, polycrystalline silicon has high request of purity that needs quite advanced technology to achieve. This article introduces influences upon production cost and energy consumption with the use of improved Siemens method, and proposes that polytrophic-photovoltaic industry needs to be systematized, normalized and standardized for its healthy development.

• Periodical: Advanced Materials Research (Volumes 1008-1009)
• Pages: 1470-1476
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1008-1009.1470
• Online since: August 2014
• Authors: Chang An Ye*, Xiao Fen Zhang
• Keywords: Key Technology, Photovoltaic, Polycrystalline Silicon

References

[1] Sichuan Yongxiang polysilicon company. Polycrystalline silicon hydrogen reducing furnace suitable for low-voltage normal power supply hot start: China, 201105993Y[P]. (2007).

[2] GHETTI, Gianfranco. Process and Plantfor the purification of trichlorosilane and silicon tetrachloride: WO, 054325[P]. (2006).

[3] French BodyCorporation. A process of the purification of liquid halosilanes or halogermanes: GB, 975000[P]. (1964).

[4] Kotzsch H J, Vahlensieck H J. Method of purifying chlorosilanes: US, 1241108[P]. (1969).

[5] Herbert J. Moltzan, DeW inn Fyffe, etc. Method for the purificationof trichlorosilane. US, 3516803[P]. (1966).

[6] Li Qunsheng, Ye Yongheng. Principle and application of multi effect rectification [J]. progress in chemical industry, 1992, 11: 40-43.

[7] Gao Weiping, Yang Ying, etc. A high efficient energy-saving rectification chemical industry technology development and application [J]. Journal of Jilin Institute of Chemical Technology, 2008, 3 (25): 1-4.

[8] Chen Wen, Xu Yu, etc. Study on the new process of trichlorosilane rectification and energy saving application [J]. progress in chemical industry, 2009, 28: 297-300.

[9] GusevA V, KomevR A, SukhanovA Y. Preparation of trichlorosilane by plasm a hydrogenation ofSilicon tetrachloride[J]. Inorganic Materials, 2006 (42): 1123-1126.

[10] GilbertGeisberger, Frank Baumann, Andreas Daniels. Continuous hydrosilylation process: US, 7145028B2[P]. (2006).

[11] Chen Hanbin, Li Yuliang, Yin Yongxiang. Present situation and development trend of silicon tetrachloride conversion technology [J]. chlor alkali chemical industry, 2009, 4 (45): 26-30.