Research Progress in Gasochromics Mechanism of Tungsten Oxide Thin Films

Abstract:

The gasochromic effect and its potential applications of tungsten oxide (WO₃) thin films are introduced. The research progress in gasochromics mechanism of WO₃ films is reviewed and various mechanism models are summarized and discussed. The double injection model, oxygen vacancy diffusion model and localized water molecules model are extensively used to explain the gasochromic coloration of WO₃ films. A perspective on the gasochromics mechanism development of WO₃ films is tended to fabricate WO₃ film with single crystal and regular structure, which may simply the quantitative characterizations induced by the complicated structure. Elucidating gasochromics mechanism of WO₃ films not only helps to understand gasochromic coloration phenomenon well but also improves the performance of gasochromic coloration devices. It also accelerates the development of the relative science, such as gas detector, atom/ion transport material, surface catalysis of semiconductor, and so on.

• Periodical: Advanced Materials Research (Volumes 1070-1072)
• Pages: 471-474
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1070-1072.471
• Online since: December 2014
• Authors: Mei Han Wang*, Hao Lei, Jia Xing Wen, Yutaka Sawada, Yoichi Hoshi, Takayuki Uchida, Zhao Xia Hou
• Keywords: Gasochromics Mechanism, WO₃ Thin Films

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