p.200
p.205
p.213
p.217
p.221
p.225
p.234
p.241
p.246
Development of New Ion and Plasma Surface Modification Methods
Abstract:
The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in Tomsk Polytechnic University (TPU), for DC vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively – pulsed ion mixing with ion beams and plasma flow formed in the «Raduga-5» source, and the method of coating deposition and ion implantation, including an application of the filtered DC metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10–99 %.
Info:
Periodical:
Pages:
221-224
Citation:
Online since:
January 2015
Authors:
Price:
Сopyright:
© 2015 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: