Process Optimization and Structural Characterization of Fe₃Si Layer by Pulse Electrodeposition

Abstract:

Fe3Si layer was prepared by pulse eletrodeposition of Si on the surface of non-oriented steel in molten salts. With an orthogonal test the optimal process parameters were determined: the formulation of salts was NaCl:KCl:NaF:SiO2=1:1:3:0.3(mole ratio), current density of 60 mA/ cm2, duty cycle of 30%, pulse period of 1000 s and a deposition time of 50 min, respectively. The compositional depth profile, the structure, the surface morphology and cross sectional micrograph of the layer were studied by glow discharge spectrometry (GDS), X ray diffraction (XRD), scanning electron microscopy (SEM) and optical microscope (OM). The results showed that Si in the layer existed in the form of the gradient distribution. The phase structure of the layer was composed of the single-phase Fe3Si. The layer composed of equiaxed grains. The surface appeared smooth and dense, and with uniform thickness.

• Periodical: Advanced Materials Research (Volumes 129-131)
• Pages: 1201-1205
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.129-131.1201
• Online since: August 2010
• Authors: Hai Li Yang, Ai Min Gao, Yu Zhu Zhang, Yun Gang Li, Guo Zhang Tang, Kuo Wang Jia, Fu Jia Wang
• Keywords: Composition, Current Density, Fe₃Si Layer, Microstructure, Process Optimisation, Pulse Electrodeposition, Si Diffusion Layer

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