Electrochemical Migration Characteristics of Ag-Plated Cu Powders in Conductive Thick Film

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Abstract:

Silver electrochemical migration results in the degradation of surface insulation resistance, and has been attributed to the dendritic bridge between adjacent conductors. In this paper, the electrochemical migration behavior of both Ag-plated Cu powder and pure silver powder in conductive thick film (CTF) are investigated. By Electrochemical migration test (water drop+ DC bias method), and the SEM and XRD examinations, it was found that the silver electrochemical migration in CTF was minimized when the Ag-plated Cu powder substitute silver powder in CTF. This is ascribed to the galvanic coupling effect that plays an important role in the migration inhibition. As sacrifice anode copper restrains the cathodic silver from dissolving in solution so as to decreases the probability of dendritic growth.

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Advanced Materials Research (Volumes 146-147)

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1070-1074

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October 2010

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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[1] S. Yang, J. Wu and A. Christou: Microelectronics Reliability Vol. 46 (2006), p. (1915).

Google Scholar

[2] X.G. Cao, B.L. Wu: Materials for Mechanical Engineering Vol. 29 (2005), p.31 (In Chinese).

Google Scholar

[3] L.Y. Zhong, B.L. Wu and L.Y. He: Paint and Coatings Industry Vol. 33 (2003), p.12 (In Chinese).

Google Scholar

[4] G.Y. Charles, K.N. Han: Journal of the Electrochemical Society Vol. 142 (1995), p.1819.

Google Scholar

[5] H. Zhu, F.X. Gan: Journal of Chinese Society for Corrosion and Protection Vol. 25 (2005), p.245 (In Chinese).

Google Scholar

[6] J.Y. Jung, S.B. Lee, Y.C. Joo, H.Y. Lee and Y.B. Park: Microelectronic Engineering Vol. 34 (2008), p.1597.

Google Scholar

[7] G. Harsányi: IEEE Transactions on Components, Packaging, and Manufacturing Technology – Part A Vol. 18 (1995), p.602.

Google Scholar

[8] J.C. Lin, J.Y. Chan: Materials Chemistry and Physics Vol. 43 (1996), p.256.

Google Scholar

[9] T. Takemoto, R.M. Latanision, T.W. Eagar and A. Matsunawa: Corrosion Science Vol. 39 (1997), p.1415.

DOI: 10.1016/s0010-938x(97)00038-3

Google Scholar

[10] G.T. Kohman, H.W. Hermance and Downes: The Bell System Technical Journal Vol. 34 (1995), p.1115.

Google Scholar

[11] C. Dominkovics, G. Harsányi: Microelectronics Reliability Vol. 48 (2008), p.1628.

Google Scholar

[12] J.J. Steppan, J.A. Roth, L.C. Hall, D.A. Jeannotte and S.P. Carbone: Journal of the Electrochemical Society: Solid-State Science and Technology, Vol. 134 (1987), p.175.

Google Scholar