Deposition of TiO2 Thin Films Using Magnetron Sputtering
TiO2 with 20nm in diameter have been prepared by using magnetron sputtering technique. The structure of these powers was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using XRD, SEM measurements.
X. L. Guo "Deposition of TiO2 Thin Films Using Magnetron Sputtering", Advanced Materials Research, Vols. 217-218, pp. 1743-1746, 2011