Deposition of TiO2 Thin Films Using Magnetron Sputtering

Abstract:

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TiO2 with 20nm in diameter have been prepared by using magnetron sputtering technique. The structure of these powers was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using XRD, SEM measurements.

Info:

Periodical:

Advanced Materials Research (Volumes 217-218)

Edited by:

Zhou Mark

Pages:

1743-1746

DOI:

10.4028/www.scientific.net/AMR.217-218.1743

Citation:

X. L. Guo "Deposition of TiO2 Thin Films Using Magnetron Sputtering", Advanced Materials Research, Vols. 217-218, pp. 1743-1746, 2011

Online since:

March 2011

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$35.00

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