Deposition of TiO₂ Thin Films Using Magnetron Sputtering

Abstract:

TiO2 with 20nm in diameter have been prepared by using magnetron sputtering technique. The structure of these powers was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using XRD, SEM measurements.

• Periodical: Advanced Materials Research (Volumes 217-218)
• Pages: 1743-1746
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.217-218.1743
• Online since: March 2011
• Authors: Xing Long Guo
• Keywords: Magnetron Sputtering, Nanometer Particle, TiO₂

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