Effect of Sputtering Parameters on the Property of TaNx/Ag/TaNx Low-Emissivity Film
The effect of deposition parameters such as sputtering power, nitrogen flow rate and thickness of TaNx on the optical performance and chemical durability of composite Tantalum nitride /Ag/ tantalum nitride (TaNx/Ag/TaNx) films was investigated. When the configuration of composite film was TaNx (60nm)/Ag (12nm)/TaNx (60nm) accompanying with the sputtering power 120W and the nitrogen flow rate 50sccm, the visible light transmittance of composite film could reach up to 80% at the wavelength of 550nm and the emissivity was 0.087. In addition, the chemical durability of the coatings was evaluated and the results indicated that the low-e coating presented very good chemical durability.
Jinglong Bu, Pengcheng Wang, Liqun Ai, Xiaoming Sang, Yungang Li
J. M. Huang et al., "Effect of Sputtering Parameters on the Property of TaNx/Ag/TaNx Low-Emissivity Film", Advanced Materials Research, Vols. 287-290, pp. 2261-2266, 2011