Effect of Sputtering Parameters on the Property of TaNx/Ag/TaNx Low-Emissivity Film

Abstract:

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The effect of deposition parameters such as sputtering power, nitrogen flow rate and thickness of TaNx on the optical performance and chemical durability of composite Tantalum nitride /Ag/ tantalum nitride (TaNx/Ag/TaNx) films was investigated. When the configuration of composite film was TaNx (60nm)/Ag (12nm)/TaNx (60nm) accompanying with the sputtering power 120W and the nitrogen flow rate 50sccm, the visible light transmittance of composite film could reach up to 80% at the wavelength of 550nm and the emissivity was 0.087. In addition, the chemical durability of the coatings was evaluated and the results indicated that the low-e coating presented very good chemical durability.

Info:

Periodical:

Advanced Materials Research (Volumes 287-290)

Edited by:

Jinglong Bu, Pengcheng Wang, Liqun Ai, Xiaoming Sang, Yungang Li

Pages:

2261-2266

DOI:

10.4028/www.scientific.net/AMR.287-290.2261

Citation:

J. M. Huang et al., "Effect of Sputtering Parameters on the Property of TaNx/Ag/TaNx Low-Emissivity Film", Advanced Materials Research, Vols. 287-290, pp. 2261-2266, 2011

Online since:

July 2011

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Price:

$35.00

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