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Effect of Sputtering Parameters on the Property of TaNx/Ag/TaNx Low-Emissivity Film

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Abstract:

The effect of deposition parameters such as sputtering power, nitrogen flow rate and thickness of TaNx on the optical performance and chemical durability of composite Tantalum nitride /Ag/ tantalum nitride (TaNx/Ag/TaNx) films was investigated. When the configuration of composite film was TaNx (60nm)/Ag (12nm)/TaNx (60nm) accompanying with the sputtering power 120W and the nitrogen flow rate 50sccm, the visible light transmittance of composite film could reach up to 80% at the wavelength of 550nm and the emissivity was 0.087. In addition, the chemical durability of the coatings was evaluated and the results indicated that the low-e coating presented very good chemical durability.

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Periodical:

Advanced Materials Research (Volumes 287-290)

Pages:

2261-2266

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.287-290.2261

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Online since:

July 2011

Authors:

Jia Mu Huang, Xiao Pei Hao, Meng Wu, Ge Tao Hu

Keywords:

Chemical Durability, Low Emissivity, Optical Transmittance, TanX/ag/tanX

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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