Effects of Substrate Bias Voltage on the Critical Failure Load of Cr-Al-N Coatings
Cr-Al-N coatings with the thickness of about 2 mm have been prepared in a magnetron sputtering system by reactive co-sputtering from a chromium target and an aluminum target in a mixed Ar/N2 atmosphere. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated by a scratch test as the VB varied from 0 to –150 V. The critical failure load reached the maximum value for the coating deposited under VB = –50 V, then decreased with VB further increasing. Re-sputter effect of The heavy bombardment of the ion to the substrate improve the critical failure load for the coating deposited under VB = –50 V. The decrease of the critical failure loads for the coatings deposited under –100V and –150 V probably resulted from the high microstrain in the crystal lattice.
Yungang Li, Pengcheng Wang, Liqun Ai, Xiaoming Sang and Jinglong Bu
S. W. Duo et al., "Effects of Substrate Bias Voltage on the Critical Failure Load of Cr-Al-N Coatings", Advanced Materials Research, Vols. 291-294, pp. 180-183, 2011