Reducing Surface Defects of Cr_XO_Y Film in Mid-Frequency Dual-Magnetron Sputtering

Abstract:

Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of Cr_xO_y film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of -120~-240 V, an optimized Cr_xO_y film has been synthesized with surface defect density low to 78 defect/mm^-2.

• Periodical: Advanced Materials Research (Volumes 291-294)
• Pages: 219-222
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.291-294.219
• Online since: July 2011
• Authors: Xiang Yu, Lei Ma, Yang Liu, Zhong Zhou Yang, Hua Meng
• Keywords: Cr_XO_Y Film, Forming Mechanism, Mid-Frequency Dual-Magnetron Sputtering, Surface Defect

References

[1] M. Abazari, Q.Z. Xue, C. L. Chang and S. Ramanathan. Thin Solid Films 519 (2011), p.3196

[2] X. Yu, C. B. Wang, M. Hua, Y. Liu and D. Y. Yu. J Nanosci. Nanotechno. 10 (2010), p.5379

[3] M.F. Al-Kuhaili and S.M.A. Durrani. Opt. Mater. 29 (2007), p.709

[4] X. Yu, Y. Liu, C. B. Wang, X. C. Lu and D. Y. Yu. Vacuum 80 (2005), p.324

[5] C. B. Wang , X. Yu and M. Hua. Appl. Surf. Sci. 256 (2009), p.1431

[6] M. Nastasi, X.M. He, K. C. Walter, M. Hakovirta, and M. Trkula. Surf. Coat. Technol. 136 (2001), p.162

[7] X. Yu, M. Hua, C.B. Wang, Z.Q. Fu and Y. Liu. Appl. Surf. Sci. 253(2007), p.3705

[8] J.W, S.K. Tien and Y. C. Kuo. Thin Solid Films 494(2006), p.161

[9] Harish C. Barshilia and K.S. Rajam. Appl. Surf. Sci. 255(2008), p.2925