Electrochemical Characterization of Metal Oxynitride Thin Film as New Lithium Storage Materials

Abstract:

Metal oxynitride (V_xON, Cr_xON) thin film has been fabricated by reactive dc sputtering method and annealing process. Its electrochemical properties are investigated in a M_xON/Li cell. The reversible specific capacities are around 830 mAh g^-1 for V_xON and 730 mAh g^-1 for Cr_xON. By using selected-area electron diffraction and X-ray photoelectron spectroscopy measurements, New electrochemical reaction mechanism is uncovered, which should be responsible for its good electrochemical performance.

• Periodical: Advanced Materials Research (Volumes 295-297)
• Pages: 912-916
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.295-297.912
• Online since: July 2011
• Authors: Yong Ning Zhou, Zheng Wen Fu
• Keywords: DC Sputtering, Lithium Battery, Thin Film

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