Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator

Abstract:

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In this paper, the effect of resident stress on surface flatness and aberration correction ability of spatial light modulator (SLM) is studied. An optical simulation model based on ZEMAX software is presented to calculate the Strehl ratio of SLM. The result shows that the decrease of curvature radius can result in the decrease of Strehl ratio and aberration correction ability. Moreover, resident tensile stress and resident compressive stress have the same effect on the change of Strehl ratio.

Info:

Periodical:

Advanced Materials Research (Volumes 317-319)

Edited by:

Xin Chen

Pages:

1677-1680

DOI:

10.4028/www.scientific.net/AMR.317-319.1677

Citation:

F. R. Hu et al., "Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator", Advanced Materials Research, Vols. 317-319, pp. 1677-1680, 2011

Online since:

August 2011

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Price:

$35.00

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