Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator

Fang Rong Hu; Yi Xian Qian; Jun Hao Niu; Li Juan Zhang; Kun Nie

doi:10.4028/www.scientific.net/AMR.317-319.1677

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 317-319Effect of Resident Stress on the Aberration...

Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator

Abstract:

In this paper, the effect of resident stress on surface flatness and aberration correction ability of spatial light modulator (SLM) is studied. An optical simulation model based on ZEMAX software is presented to calculate the Strehl ratio of SLM. The result shows that the decrease of curvature radius can result in the decrease of Strehl ratio and aberration correction ability. Moreover, resident tensile stress and resident compressive stress have the same effect on the change of Strehl ratio.

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Periodical:

Advanced Materials Research (Volumes 317-319)

Pages:

1677-1680

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.317-319.1677

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Online since:

August 2011

Authors:

Fang Rong Hu, Yi Xian Qian, Jun Hao Niu, Li Juan Zhang, Kun Nie

Keywords:

Aberration Correction, Micro-Electromechanical System (MEMS), Resident Stresses, Spatial Light Modulator (SLM), Zemax Software

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References

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