Numerical Simulation of Temperature Field during the Growth of Nd:GGG Laser Crystal

Cai Hong Zhang; Lin Bi; Zi Zhou Gong

doi:10.4028/www.scientific.net/AMR.328-330.58

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 328-330Numerical Simulation of Temperature Field during...

Numerical Simulation of Temperature Field during the Growth of Nd:GGG Laser Crystal

Abstract:

The numerical simulation research on temperature field of crystal and melt by using finite differential method during the growth of Nd:GGG crystal by Cz (Czochralski) method was reported. At first, the mathematical model of the growth of Nd:GGG crystal was given, then the equations without dimensions were given. Finally, the boundary condition was given and the equations were solved by finite differential method. The simulation program was given by above method.Then the change of temperature field of crystal and melt was described by simulation program. The influence of technical conditions of temperature field in the crystal and melt was analyzed.

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Periodical:

Advanced Materials Research (Volumes 328-330)

Pages:

58-62

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.328-330.58

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Online since:

September 2011

Authors:

Cai Hong Zhang, Lin Bi, Zi Zhou Gong

Keywords:

Finite Differential Method, GGG Laser Crystal, ND, Numerical Simulation, Temperature Field

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