A Inductive Accelerator Based on UV Lithography of SU-8

Abstract:

This paper describes a novel inductive accelerator and investigates some of the parameters affecting its performance. As a important component of the accelerator, the resonator is composed of a new-style tunable inductor and a fixed capacitor. When an acceleration is applied on the resonator in the vertical direction, we can acquire the acceleration value by measuring the changes of the resonant frequency passing through a differential frequency circuit. Design and simulation, we get out the frequency of the accelerator is proportional to the acceleration, inductance variation ranges from 0 to 0.2*10^-9H, and frequency variation is from 0 to 5.7*10⁹HZ when the capacitor spacing is 2um. We use SU-8 photoresist to fabricate thick metal layer.

• Periodical: Advanced Materials Research (Volumes 418-420)
• Pages: 1925-1929
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.418-420.1925
• Online since: December 2011
• Authors: Bin Zhen Zhang, Xiang Hong Li, Yong Zhang, Xiang Jiao Meng
• Keywords: Inductive Accelerator, LC Resonator, Quality Factor, SU-8

References

[1] Zine-El-Abidine, M. Okoniewski and J. G. McRory, in: A MEMS Tunable Inductor, NSTI-Nanotech 2004, www.nsti.org, ISBN 0-9728422-7-6 Vol. 1, 2004.

DOI: 10.1109/icmens.2004.1332381

[2] Jianlin Liu, Xianghong Li, Binzhen Zhang, Jian Zhang, Changhong Ji, Haitao Yao, in: Fabrication and analysis of a tunable inductor, Applied Mechanics and Materials, v 80-81, pp.990-995, 2011.

DOI: 10.4028/www.scientific.net/amm.80-81.990

[3] Reza Kamali-Sarvestani, John D.Williams, in: Fabrication of High Quality Factor RF-Resonator Using Embedded Inductor and Via Capacitor, IEEE,2010.

DOI: 10.1109/iecon.2010.5675102

[4] Yong Ding, Zewen Liu, Litian Liu, in: Q value for structural optimization of micromachined planar spiral inductor, Institute of Microelectronics, Tsinghua University, Bei jing 100084,2001，in China.

[5] Jin-Woo Park, Jae Yeong Park, Member, IEEE, Yeun-Ho Joung, and Mark G. Allen, Member, IEEE, in: Fabrication of High Current and Low Profile Micromachined Inductor With Laminated Ni/Fe Core, IEEE Transactions on components and packaging technologies , Vol. 25, NO. 1, March 2002.

DOI: 10.1109/6144.991182

[6] V. Malba, D. Young, J. J. Ou, A. F. Bernhardt, and B. E. Boser, in: High-Performance RF Coil Inductors on Silicon, Department of Electrical Engineering and Computer Sciences University of California, Berkeley, California 94720, May 25-28, 1998.

DOI: 10.1109/ectc.1998.678702

[7] Xianghong Li, Jianlin Liu, Binzhen Zhang, in: Design and Analysis of a MEMS Tunable Inductor Based on UV Lithography of SU-8, 2011.