The Influence of Zirconia Substrate Temperature on the Microstructure and Adhesion of Deposited Mg Films

Abstract:

Mg films were prepared by magnetron sputtering on zirconia substrate. The surface morphology, structure and adhesion performance were determined by scanning electron microscopy (SEM), X-ray diffraction (XRD) and automatic nano scratch tester, respectively. The results show that the Mg films deposited on the substrates at 50 °C, 200 °C, 300 °C are mainly of hexagonal phase with the crystal planes (002) in highly preferred orientation that is weaken with the substrate temperature increased. After annealed at 230 °C, the quality of thin film deposited on the substrate at 50 °C can be improved as crystallizability enhanced and grain size increased. The adhesion of Mg film increases firstly, and then decreases with increasing the substrate temperatures.

• Periodical: Advanced Materials Research (Volumes 472-475)
• Pages: 2834-2838
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.472-475.2834
• Online since: February 2012
• Authors: Fei Xiong Mao, Tao Liu, Shi Wei Liu, Jing Kun Yu
• Keywords: Magnetron Sputtering, Mg Film, Substrate Temperature, Zirconia

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