Anodic Behavior of Copper in 1-Hydroxyethylene-1, 1-Diphosphonic Acid (HEDPA) Baths

Jing Wu Zheng; Biao Zheng; Yao Ying; Liang Qiao; Li Qiang Jiang; Cheng Zhang

doi:10.4028/www.scientific.net/AMR.472-475.3

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Anodic Behavior of Copper in 1-Hydroxyethylene-1, 1-Diphosphonic Acid (HEDPA) Baths
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 472-475Anodic Behavior of Copper in 1-Hydroxyethylene-1,...

Anodic Behavior of Copper in 1-Hydroxyethylene-1, 1-Diphosphonic Acid (HEDPA) Baths

Abstract:

The electrochemical behavior of anodic dissolution of copper electrode was investigated in non-cyanide alkaline electrolyte containing 1-hydroxyethylene-1, 1-diphosphonic acid (HEDPA) as a complexing agent. Electrochemical behavior of copper electrode was studied by cyclic voltammetry. X-ray photoelectron spectroscopy was used to study morphologies of copper electrode after dissolution under different potentials. The results showed that in cyclic voltammetry curve of the 1-hydroxyethylene-1,1-diphosphonic Acid(HEDPA) baths, the first peak of copper anode was diffusion-controlled, associated with the formation of Cu2O. The second oxidation peak came from generating CuO and the third peak was the formation of CuO/Cu(OH)2 compound.

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Advanced Manufacturing Technology, ICMSE 2012

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Advanced Materials Research (Volumes 472-475)

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3-7

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https://doi.org/10.4028/www.scientific.net/AMR.472-475.3

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February 2012

Authors:

Jing Wu Zheng, Biao Zheng, Yao Ying, Liang Qiao, Li Qiang Jiang, Cheng Zhang

Keywords:

Copper Anode, Dissolution Mechanism, Hydroxyethylene-1 1-Diphosphonic Acid (HEDPA)

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