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A Model for the Films Formation of Nb–Si–N Ternary Compound Deposited

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Abstract:

By means of the reactive magnetron sputtering method, a series of Nb–Si–N composite films with different Si contents were deposited in an Ar, N2 and SiH4 mixture atmosphere. These films’ chemical composition, phase formation, microstructure and mechanical properties were characterized by the energy dispersive spectroscopy, X-ray diffraction, transmission electron microcopy, atomic force microscopy and nanoindentation. In the Nb–Si–N films, 3 distinct concentration regions have been observed depending on the Si content. Based on the three concentration regions, a three-step model is proposed for the film formation of the Nb–Si–N thin films. This model correlates nanoscale structures with macroscopic properties of the films.

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Periodical:

Advanced Materials Research (Volumes 476-478)

Pages:

475-479

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.476-478.475

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Online since:

February 2012

Authors:

Yong Jun Jiang

Keywords:

Atoms, Model, Nanohardness, Nb–Si–N

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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