Kinetics Study of Aluminum Deposition on Inner Wall of Pipes by Atomic Layer Deposition

Heng Liu; Yu Qing Xiong; Ji Zhou Wang

doi:10.4028/www.scientific.net/AMR.482-484.627

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 482-484Kinetics Study of Aluminum Deposition on Inner...

Kinetics Study of Aluminum Deposition on Inner Wall of Pipes by Atomic Layer Deposition

Abstract:

In this paper, feasibility of aluminium deposition on inner wall of pipes by atomic layer deposition was studied. Firstly, by solving kinetics equation of gas adsorption on the pipe inner wall, the time for the reactant to reach saturated adsorption on the wall was calculated. Secondly, according to the aluminium crystal structure, the thickness of each deposition cycle was obtained. Finally, the minimum aluminium thickness and number of atomic layer deposition cycles that can meet electromagnetic requirement of wave guide was calculated.

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Periodical:

Advanced Materials Research (Volumes 482-484)

Pages:

627-632

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.482-484.627

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Online since:

February 2012

Authors:

Heng Liu, Yu Qing Xiong, Ji Zhou Wang

Keywords:

Aluminum (Al), Atomic Layer Deposition, Inner Wall, Pipe, Waveguide

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