Preparation of ZnO:Zr Thin Films by Sputtering Zn:Zr Targets

Chang Kun Yuan

doi:10.4028/www.scientific.net/AMR.549.331

Paper Titles

Modification of Cyanate Ester Resin by Epoxy-Functionalized Polyhedral Oligomeric Silsesquioxane
p.314

Adsorption Behavior and Kinetics of Methyl Orange in Water on Activated Carbon
p.318

Crystallization Properties of Nucleated Poly(lactic acid)
p.322

Peroxyl Radical Scavenging Ability of Fifty Kinds of Chinese Medicines Determined by an ESR Spin-Trapping Technique
p.327

Preparation of ZnO:Zr Thin Films by Sputtering Zn:Zr Targets
p.331

LaF₃ Influences on Wear Resistance of TiC/Ni Cladding Layer by Laser Cladding In Situ Fabricated
p.335

Synthesis and Adsorption of Molecularly Imprinted Polymers of Dibutyl Phthalate in Food
p.340

Preparation and Characterization of Cyanoethylated Cellulose Fiber
p.344

Boron Recovery from the Liquid Mineral Resources
p.349

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 549Preparation of ZnO:Zr Thin Films by Sputtering...

Preparation of ZnO:Zr Thin Films by Sputtering Zn:Zr Targets

Abstract:

Transparent conductive ZnO:Zr thin films with different thicknesses were fabricated on glass slides by DC reactive magnetron sputtering from Zn:Zr targets consisting of Zn disk and Zr metallic chips in Ar+O₂ mixture gas. X-ray diffraction, four-point probe measurements, UV–vis spectrophotometers and thin film thickness tester were employed to characterize the structure, electrical and optical properties of ZnO:Zr films, respectively. The experimental investigations indicate that film thickness has an important effect on the crystal structure, optical and electrical properties of the deposited films.