Characterization and Properties of CrTiN Films

Tao Liu; Xin Hui Zhang; Xiao Mei Yuan; Xiao Hui Zheng; Guang An Zhang

doi:10.4028/www.scientific.net/AMR.625.301

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 625Characterization and Properties of CrTiN Films

Characterization and Properties of CrTiN Films

Abstract:

A series of CrTiN films were successfully deposited by medium frequency magnetron sputtering in a mixture gas of nitrogen and argon. X-ray diffraction analysis shows that the CrTiN have preferential orientation of (200). The films show low friction and low wear rate at a certain percentage of the Ti content.

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Periodical:

Advanced Materials Research (Volume 625)

Pages:

301-303

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.625.301

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Online since:

December 2012

Authors:

Tao Liu, Xin Hui Zhang, Xiao Mei Yuan, Xiao Hui Zheng, Guang An Zhang

Keywords:

CrTiN, Triboligical, X-Ray Diffraction (XRD)

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