Investigation of the Geometry Modeling of Metal Organic Halide Vapor Phase Epitaxy (MOHVPE) Reactor

N. Zieyana Mohamed Annuar; Mohd Faizul Mohd Sabri; A. Shuhaimi Abu Bakar

doi:10.4028/www.scientific.net/AMR.626.396

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 626Investigation of the Geometry Modeling of Metal...

Investigation of the Geometry Modeling of Metal Organic Halide Vapor Phase Epitaxy (MOHVPE) Reactor

Abstract:

The new approach for designing a horizontal metal organic halide vapor phase epitaxy (MOHVPE) reactor chamber is proposed. The model is conjugated with comprehensive detailed simulation for horizontal tube reaction chamber by using computerized software. The modeling approach is based on the hybridization of MOCVD and HVPE. The development consists of 5 inlet nozzles with dimension of 54 cm long. The numerical study of horizontal MOHVPE growth shows dependence on temperature and species flow rates. The inlet area is set to room temperature while the whole chamber is set in the temperature range from 1273 K to 1473 K. It is seen that the flow pattern is influenced more by the temperature distribution and geometry of the chamber.

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Advanced Materials Research (Volume 626)

Pages:

396-400

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.626.396

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Online since:

December 2012

Authors:

N. Zieyana Mohamed Annuar, Mohd Faizul Mohd Sabri, A. Shuhaimi Abu Bakar

Keywords:

LED Application, Metal Organic Chemical Vapor Deposition (MOCVD), Reactor Geometry, Thin Film

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