The Study of HEPA/ULPA Filter Efficiency Certification with Properties of Semiconductor Materials in Semiconductor Industry

Yi Jui Chiu; Chia Hao Yang; Luh Maan Chang; Khai Shoon Leong

doi:10.4028/www.scientific.net/AMR.643.120

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The Study of HEPA/ULPA Filter Efficiency Certification with Properties of Semiconductor Materials in Semiconductor Industry
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 643The Study of HEPA/ULPA Filter Efficiency...

The Study of HEPA/ULPA Filter Efficiency Certification with Properties of Semiconductor Materials in Semiconductor Industry

Abstract:

This paper aims to develop in the semiconductor plant molecular filtration efficiency with properties of semiconductor materials in the real-time. The goal of the assessment is to propose a new device based on the technologies assessed. First, the Scanning Mobility Particle Sizer Spectrometer with CPC (SMPS+C), a description of how each counter works is given. Second, a new experiment method for HEPA/ULPA filter efficiency certification in the real-time in semiconductor industry is developed. The experimental results showed that the performance of capillary had been installed and cleaned. The SMPS mean diameter fell within the range of the NIST standard. And, the HEPA/ULPA filter efficiency certification is explored. The best filtration efficiency particles size is 0.16μm. The results of this research provide the engineers with very useful information in semiconductor industry.

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Periodical:

Advanced Materials Research (Volume 643)

Pages:

120-124

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.643.120

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Online since:

January 2013

Authors:

Yi Jui Chiu, Chia Hao Yang, Luh Maan Chang, Khai Shoon Leong

Keywords:

HEPA, Nanoparticle, Semiconductor

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