Effect of Argon Gas Flow on the Thermal Field in a Directional Solidification System for Multi-Crystalline Silicon

Xiang Rong Ma; Wu Zan; Xin Liang Zhang

doi:10.4028/www.scientific.net/AMR.690-693.945

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 690-693Effect of Argon Gas Flow on the Thermal Field in a...

Effect of Argon Gas Flow on the Thermal Field in a Directional Solidification System for Multi-Crystalline Silicon

Abstract:

Directional Solidification System (DSS) is the commonly used casting station in the solar industry. In order to better understand the casting process, we carried out global simulations of heat transfer to investigate effect of argon gas flow on the thermal field in a directional solidification system for multi-crystalline silicon (mc-Si). The effect of argon gas flow on the global heat transfer and the melt convection are investigated. It was found that the heat transfer at the melt free surface due to the gas convection can not be neglected, though the argon gas flow contributes little to the global heat transfer at most radiative surfaces.

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Periodical:

Advanced Materials Research (Volumes 690-693)

Pages:

945-948

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.690-693.945

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Online since:

May 2013

Authors:

Xiang Rong Ma, Wu Zan, Xin Liang Zhang

Keywords:

Argon Gas Flow, Directional Solidification, Multi-Crystalline Silicon (mc-Si), Simulation

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