Study on Solar Materials with New Solar Cell Structure Using Surface Selective Etching and Periodical Barrier Technology

Kao Feng Yarn; Chao Kun Kuo; I Ting Hsieh; Wen Chung Chang

doi:10.4028/www.scientific.net/AMR.700.19

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 700Study on Solar Materials with New Solar Cell...

Study on Solar Materials with New Solar Cell Structure Using Surface Selective Etching and Periodical Barrier Technology

Abstract:

This study presents a simple technique for improving the power conversion efficiency of a AlGaAs-GaAs based solar cell. A traditional III-V semiconductor solar cell heterojunction structure, i.e. n-GaAs/n-AlGaAs/n-GaAs/i-GaAs/p-GaAs is used. The top n-GaAs/n-AlGaAs structure is responsible for the selective etching stop layer. The selective etched surface barriers associated with polymer gratings with different aspect ratios are produced on solar cell by using the photolithography and Micro Electro Mechanical Systems (MEMS) techniques. A reflective-type diffraction optical grating is fabricated on the surface of the solar cell to redirect the incident light reflected from the solar cell back onto the solar cell surface. The experimental results show that the addition of the optical grating increases the open circuit voltage, Voc, from 4.51 V to 4.73V and improves the maximum output voltage, V_m, from 4.12V to 4.32V. From inspection of surface reflectivity , the average reflectivity is also found to be 13.7% down to 9.9 %.

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Periodical:

Advanced Materials Research (Volume 700)

Pages:

19-22

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.700.19

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Online since:

May 2013

Authors:

Kao Feng Yarn, Chao Kun Kuo, I Ting Hsieh, Wen Chung Chang

Keywords:

MEMS, Power Conversion Efficiency, Reflective-Type Diffraction, Selective Etching, Solar Cell

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