Electrochromic Performance of NiO Films in Alkaline Medium

Abstract:

An investigation on the electrochromic performance of NiO films in 1M KOH was carried out using cyclic voltammetric technique. The NiO films were deposited on ITO glass substrate using bath solution containing nickel sulfate, sodium acetate and sodium sulfate at pH 6.7 by applying constant current of 0.2 mA cm^-2 for 300 s at different deposition temperatures (ie: 25 °C, 40 °C and 80 °C). The as-deposited films were undergone post treatment through annealing process at 300 °C for 900 s. The surface morphology of the NiO thin films was characterized by field-emission scanning electron microscopy (FESEM) and the electrochemical properties of both NiO films were measured in 1M KOH electrolyte by cyclic voltammetry (CV). Deposition at 25 °C produced a smooth and compact thin film on the ITO surface. However, when higher temperatures were used (ie: 40 °C and 80 °C), porous structure of NiO formed. The electrochromic performance of the smooth film prepared at 25 ° C showed is better than the porous films. The annealing process has enhanced the stability of NiO film for intercalation and de-intercalation of OH^- ions during cycling in 1M KOH. These results show that the temperature (heating and annealing process) has significantly influenced the formation of NiO films on ITO substrates which affected the performance of the electrochromic material.

• Periodical: Advanced Materials Research (Volume 748)
• Pages: 51-55
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.748.51
• Online since: August 2013
• Authors: Siti Zairyn Fakurol Rodzi, Yusairie Mohd
• Keywords: Electrochromic, Electrodeposition, Galvanostatic, Nickel Oxide (NiO)

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