Effects of Variations in Annealing Temperature and Annealing Time on the Spectral and Solid State Properties of Nickel Oxide (NiO) Thin Films

Abstract:

Chemical bath deposited nickel oxide (NiO) thin film samples were grown at room temperature of 30 °C on glass substrates. Samples k₁, k₂, and k₃ were annealed for one hour at temperatures of 100 °C, 200 °C and 300 °C respectively, while as grown sample k₄ served as a reference. A second set of samples k₅, k₇, and k₈ were annealed at a constant temperature of 300 °C for time durations of 1H, 2H and 3H respectively, with as grown sample k₆ as a reference. The spectral absorbance, transmittance and reflectance of all the thermally treated thin film samples were measured with a spectrophotmeter (D model Avantes Spec 2048 version 7.0) in the UV-VIS-NIR region of 300-900 nm wavelength. The results show distinctive variations in all the spectral properties for different combinations of annealing time and temperature, each starting at a threshold wavelength of 300 nm and ending with a distinctive minimum or maximum value. Deduced graphical values of the refractive index also show distinctive variations. For annealing time of 3 hours at a temperature of 300 °C, the results produced symmetric reflectance and symmetric refractive index with maximum values of 8% and 0.293 occurring at 500 nm wavelength and photon energy of 2.5 eV respectively. Direct transition band gap energy obtained for all the samples lie between 3.68-3.84 eV. The results reported in this paper clearly indicate that optimum combinations of production parameters of nickel oxide thin films can yield specific values of the properties for specific applications.

• Periodical: Advanced Materials Research (Volume 787)
• Pages: 262-268
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.787.262
• Online since: September 2013
• Authors: J.C. Osuwa, G.I. Onyejiuwa
• Keywords: Distinctive Variations, Nickel Oxide (NiO), Optimum Production Parameters, Specific Applications, Spectral Properties

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