Growth of Vertically Aligned ZnO Nanorods Arrays by Hydrothermal Method

Mahmoud Alimanesh; Jalal Rouhi; Norzaini Zainal; Saeid Kakooei; Hassan Zainuriah

doi:10.4028/www.scientific.net/AMR.795.616

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 795Growth of Vertically Aligned ZnO Nanorods Arrays...

Growth of Vertically Aligned ZnO Nanorods Arrays by Hydrothermal Method

Abstract:

Well-aligned ZnO nanorod arrays with different average diameters were grown on silicon (100) substrates by hydrothermal method via the precursors of zinc nitrate hexahydrate (Zn (NO3)2 .6H2O) and Hexamethylenetetramine (C6 H12N4) with equal molar concentration at 0.025 mol/l and 0.05 mol/l. The ZnO nanorods were characterized by X-ray diffraction (XRD) and field emission Scanning electron microscopy (FE-SEM). XRD results indicated that all the ZnO nanorods were preferentially grown along [000 direction (c-axis). field emission Scanning electron microscopy images showed that the well-faceted hexagonal ZnO nanorods were grown vertically from the silicon (100) substrates.

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Periodical:

Advanced Materials Research (Volume 795)

Pages:

616-619

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.795.616

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Online since:

September 2013

Authors:

Mahmoud Alimanesh, Jalal Rouhi, Norzaini Zainal, Saeid Kakooei, Hassan Zainuriah

Keywords:

Hydrothermal Method, Silicon Substrate, Well-Aligned Growth, ZnO Nanorod Arrays

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