A Study on Structure and Optical Properties of Sputtered TiO2 Films

Mei Dong Huang; Shan Du; Hong Yu Li; Chun Wei Liu; Xiao Hong Tang

doi:10.4028/www.scientific.net/AMR.875-877.223

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 875-877A Study on Structure and Optical Properties of...

A Study on Structure and Optical Properties of Sputtered TiO₂ Films

Abstract:

Influence of argon flow on the optical properties of titanium oxide films, which were fabricated on well-polished K9 glass substrate through r.f. magnetron sputtering, has been investigated. X-ray diffraction (XRD) was employed to analyse the microstructure. Surface morphology was observed by atomic force microscopy (AFM). Transmittance of the films was measured within the visible range by UV-3600 spectrometer. The optical constants, such as thickness, refractive index and extinction coefficient, were measured using an ellipsometer. The experimental results and the effects of argon flow on optical constants of the TiO₂ films have been discussed and analysed.

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Advanced Materials Research (Volumes 875-877)

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223-227

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https://doi.org/10.4028/www.scientific.net/AMR.875-877.223

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Online since:

February 2014

Authors:

Mei Dong Huang, Shan Du, Hong Yu Li, Chun Wei Liu, Xiao Hong Tang

Keywords:

Argon Flow, Optical Property, Sputter, Titanium Oxide Film

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