[1]
W.W. Schulz, J.D. Navratil, E.A. Talbot, Science and Technology of Tributylphosphate[M], CRC Press, Boca Raton, (1986).
Google Scholar
[2]
Moussa, D., Brisset, J. L. Disposal of spent tributyl phosphate by gliding arc plasma[J]. Journal of Hazardous Materials, 2003, 102(2-3): 189-200.
DOI: 10.1016/s0304-3894(03)00069-4
Google Scholar
[3]
B. Benstaali, P. Boubert, B.G. Chéron, A. Addou, J.L. Brisset, Density and rotational temperature measurements of the OH· and NO· radicals produced by a gliding arc in humid air[J]. Plasma Chemistry and Plasma Process, 2002, 22 (4): 553–571.
DOI: 10.1023/a:1021371529955
Google Scholar
[4]
R. Peyrous, R.M. Millot, Ozone generation in oxygen by corona discharges in a point-to-plane gap subjected to a chopped DC positive voltage[J]. Journal of physics D: applied physics, 1981, 14 (12): 2237–2242.
DOI: 10.1088/0022-3727/14/12/012
Google Scholar
[5]
G. I. Font, W. L. Morgan, G. Mennenga, Cross-section and chemistry model for the simulation of c-C4F8 plasma discharges[J]. Journal of Applied Physics, 2002. 91(6): 1-9.
DOI: 10.1063/1.1448894
Google Scholar
[6]
K. Yoshida, S. Goto, H. Tagashira, C. Winstead, B. V. Mckoy, Electron transport properties and collision cross sections in C2F4[J]. Journal of Applied Physics, 2002. 91(4): 1-11.
DOI: 10.1063/1.1433189
Google Scholar
[7]
X. Wang, T. Li, F. Gu. Research on the thermal ionization model of detonation products by quantum mechanics methods[J]. Combustion, Explosion and Shock waves, 2008, 44(1): 101-109.
DOI: 10.1007/s10573-008-0014-0
Google Scholar
[8]
Y. Itikawa, Cross Sentions for Electron Collisions With Water Molecules[J]. Journal of Physical and Chemical Reference Data, 2005, 34(1): 1-22.
Google Scholar
[9]
A. Oumghar, J. C. Legrand, A. M. Diamy, N. Turillon, R. I. Ben-Aim, A kinetic study of methane conversion by a dinitrogen microwave plasma[J]. Plasma Chemistry and Plasma Processing, 1994, 14(3) 229-249.
DOI: 10.1007/bf01447080
Google Scholar
[10]
W.L. Morgan, A Critical Evaluation of Low-Energy Electron Impact Cross Sections for Plasma Processing Modeling. II: CF4, SiH4, and CH4[J]. Plasma Chemistry and Plasma Processing, 1992, 12(4): 477-493.
DOI: 10.1007/bf01447255
Google Scholar
[11]
H. ZHAO, Plasma chemistry and processing[M]. 1993, Hefei: University of Science and Technology of China Press, 66-67.
Google Scholar
[12]
The Siglo Data base, CPAT, and Kinema Software[EB/OL]. http: /www. siglo-kinema. com.
Google Scholar