Studies of Surface Roughening for Sapphire Substrate

Feng Che Tsai; Ting Cheng Chang; Yann Long Lee; Chuan Lung Lin

doi:10.4028/www.scientific.net/AMR.887-888.1063

Paper Titles

Quality Control of Materials in Pressure Pipeline during the Installation
p.1036

Application of Distribution of Oxygen Coefficient in Explosive Neutron Detection
p.1040

Research and Manufacture of Tea-Cigarette
p.1048

Fatigue Propagation Life Evaluating for Materials or Components Suffered Load Spectrum by Quantitative Fractography
p.1053

Studies of Surface Roughening for Sapphire Substrate
p.1063

Review of Conductive Coating and its Application in Power Grounding System
p.1068

Design of a Simple and Demountable Experimental Device for Drag Reduction of Super Hydrophobic Surface
p.1072

Characterization of Microstructure, Phase Composition and Corrosion Resistance of Al-Zn-Si-RE Waterborne Coatings
p.1076

The Application and Analysis of EDM on the Surface Light Trapping Structure
p.1080

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Studies of Surface Roughening for Sapphire Substrate

Abstract:

This study focuses on the process of the matte roughening technique of Sapphire. In order to effectively improve the shortcomings of conventional chemical etching, research adoptsthe micro abrasive jet machining technology with the experimental design method related experiments planned in order to effectively obtain the appropriate surface roughness and processing uniformity. Study found that # 800 Zirconium applied on the surface of sapphire with the initial surface roughness of about 0.9 μmRa for two minutes forms a surface roughness of about 1.1 μmRa. Not only does this conforms to the industrys sapphire surface specifications, it also effectively reduces the coarsening time and associated costs of sapphire.