Structural and Optical Properties of VO2 Film Grown on Sapphire Substrate by Pulsed Laser Deposition

Ji Ming Bian; Li Hua Miao; Shu Kuo Zhao

doi:10.4028/www.scientific.net/AMR.912-914.325

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 912-914Structural and Optical Properties of VO2 Film...

Structural and Optical Properties of VO₂ Film Grown on Sapphire Substrate by Pulsed Laser Deposition

Abstract:

VO₂ films were grown on sapphire substrates by pulsed laser deposition (PLD), and the structural and optical properties of as-grown films were investigated by X-ray diffraction (XRD), field effect scanning electron microscopy (FESEM), photoluminescence (PL), and optical-transmission measurements. The oxygen partial pressure in the growth chamber was found to be the key factor deciding the microstructure and properties of as-deposited VO₂ films, and its effects and corresponding mechanism were investigated systemically. Results indicated that dense and uniform VO₂films with smooth surface were achieved by PLD under optimized oxygen partial pressure. Strong blue emission peaks were observed in room temperature photoluminescence (PL) spectra. Excellent selective optical-transmission of the VO₂ thin films from 200~3000 nm were also recorded at room temperature.

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Periodical:

Advanced Materials Research (Volumes 912-914)

Pages:

325-328

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.912-914.325

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Online since:

April 2014

Authors:

Ji Ming Bian*, Li Hua Miao, Shu Kuo Zhao

Keywords:

Photoluminescence (PL), Pulsed Laser Deposition, Sapphire Substrates, VO₂

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