The Study on Magnetron Sputtering Rate of Metal Targets

Abstract:

The sputtering rate of Pt, Au, Fe and Co targets was researched and they were 0.059 nm/s, 0.076 nm/s, 0.050 nm/s, and 0.030nm/s respectively. A series of magnetic multilayers were prepared using the calibrated rate and the anomalous hall effect of the samples were tested, and Hall curve was in line with expectations. The sputtering rate of Pt, Au, Fe and Co targets was appropriate for sample preparation. Suitable sputtering rate play a decisive role in sample preparation.

• Periodical: Advanced Materials Research (Volumes 926-930)
• Pages: 371-374
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.926-930.371
• Online since: May 2014
• Authors: Hai Lang Ju*, Xiao Bai Chen, Ci Zhao, Xing Lai Che, Xiong Li, Jun Gao, Liang Ting Cai, Yan An Hu
• Keywords: Extraordinary Hall Effect, Fabrication of Thin Film, Magnetron Sputtering, Metal Targets

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