Hydrophobic Coating on Silicon Wafer by Use of Industrial Coating-Bar Process in Atmosphere Parameter

Chin Lin Hsu; Shyankay Jou; Ying Ji Chuang; Ching Yuan Lin

doi:10.4028/www.scientific.net/AMR.941-944.1577

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 941-944Hydrophobic Coating on Silicon Wafer by Use of...

Hydrophobic Coating on Silicon Wafer by Use of Industrial Coating-Bar Process in Atmosphere Parameter

Abstract:

Silicon wafer is chosen in this work for the study of hydrophobic coating with industrial coating bar, due to the wafer has the superior flatness. Various amounts of TS-720 hydrophobic nano-particles were mixed into ITRI hydrophobic agent (H.A.), and this liquid mixture was applied onto material surface by use of a coating bar. In this study, we added the TS-720 nanoparticle from 0 – 2.5 wt% with ITRI H.A. The contact angle is higher than 135^o, when we have 2.5 wt% TS-720 nanoparticle adding in ITRI H.A.

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Periodical:

Advanced Materials Research (Volumes 941-944)

Pages:

1577-1580

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.941-944.1577

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Online since:

June 2014

Authors:

Chin Lin Hsu, Shyankay Jou, Ying Ji Chuang, Ching Yuan Lin*

Keywords:

Dual-Scale Roughness, Hydrophobic Coating Process of Metallic or Non-Metallic Surface, Lotus Effect, Raspberry-Like Structure, Super-Hydrophobic Surface

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* - Corresponding Author

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