Deposition of Amorphous Boron Carbide Films with Pulsed Magnetron Sputtering and Evaluation of their Mechanical Properties

Kei Saito; Ryo Fujii; Naoto Ohtake

doi:10.4028/www.scientific.net/AMR.970.97

Paper Titles

Effects of Sawdust Content and Alkali Treatment on Mechanical and Flame Retarding Properties of Sawdust/Recycled High Density Polyethylene Composites
p.79

Electron Beam Crosslinking of EVA/ENR-50/HNTS Nanocomposites in the Presence of Trimethylol Propane Triacrylate, TMPTA
p.84

Quasi-Static Flexural and Indentation Behaviour of Polymer-Metal Laminate
p.88

Corrosion Behavior of Soldered and Laser-Welded Ni-Free Co-Cr Alloy Joints in Sodium Chloride Solution
p.93

Deposition of Amorphous Boron Carbide Films with Pulsed Magnetron Sputtering and Evaluation of their Mechanical Properties
p.97

Fabrication and Characterization of RF Magnetron Sputtered Silicon Oxide Films
p.102

Fabrication Method of Mems Based Clamped-Clamped Resonant Magnetometer
p.106

Humidity Sensors on Thermally Oxidized Silicon Substrates
p.111

Influence of Spinning Speed on the Properties of Sol-Gel Spin Coated ZnO Films
p.115

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 970Deposition of Amorphous Boron Carbide Films with...

Deposition of Amorphous Boron Carbide Films with Pulsed Magnetron Sputtering and Evaluation of their Mechanical Properties

Abstract:

Amorphous boron carbide films were deposited with pulsed magnetron sputtering using a sintered B₄C target with Ar as the processing gas, and the chemical components, structure, and mechanical properties of the films were investigated. To deposit amorphous boron carbide films using a B₄C target, a pulsed power supply (14.4 kHz) was employed. Raman spectroscopy, Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS) were used to characterize the chemical compositions and structure of the films. According to the results of XPS, the B/C ratio in the films synthesized with pulsed magnetron sputtering was 2.21. Nanoindentation tests and ball-on-disk (BoD) tests were performed to evaluate the mechanical properties. It was found that the films deposited by pulsed magnetron sputtering had an average hardness of 32.1 GPa and an average Youngs modulus of 235.1 GPa.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 970)

Pages:

97-101

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.970.97

Citation:

Cite this paper

Online since:

June 2014

Authors:

Kei Saito*, Ryo Fujii, Naoto Ohtake

Keywords:

Amorphous Boron Carbide, Magnetron Sputtering, Pulsed Power Supply

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

* - Corresponding Author

References

[1] T. Hu, L. Steihl, W. Rafaniello, T. Fawcett, D.D. Hawn, J.G. Mashall, S.J. Rozeveld, C.L. Putzig, J. Blackson, W. Cernigiani, M.G. Robinson. Thin Solid Films 332 (1998) 80.

DOI: 10.1016/s0040-6090(98)01019-0

Google Scholar

[2] S. Lee, J. Mazurowski, W.L. O'Brien, Q.Y. Dong, J.J. Jia, T.A. Callcott, Y. Tan, K.E. Miyano, D.L. Ederer, D.R. Mueller, P.A. Dowben. J. Appl. Phys. 6919 (1993) 74.

Google Scholar

[3] P. Chaudhari, A. Singh, A. Topka, R. Dusane. Solid-State Electronics 78 (2012) 156-158.

Google Scholar

[4] J.C. Oliveira, O. Conde. Thin Solid Films 307 (1997) 2.

Google Scholar

[5] E. Vassallo, R. Caniello, A. Cremona, G. Croci, D. Dellasega, G. Gorini, G. Grosso, E. Miorin, M. Passoni, M. Tardocchi. Surface & Coatings Technology 214 (2013)59-62.

DOI: 10.1016/j.surfcoat.2012.11.001

Google Scholar

[6] V. Kulikovsky, V. Vorlicek, R. Ctvrtlik, P. Bohac, L. Jastrabik, H. Lapsanska. Surface & Coatings Technology 205 (2011) 4052-4057.

DOI: 10.1016/j.surfcoat.2011.02.052

Google Scholar

[7] K. Holmberg, A. Matthews, Coatings Tribology, 2nd Edition Properties, Mechanisms, Techniques and Applications in Surface Engineering (2009) pp.267-269.

Google Scholar

[8] Z. Han, G. Li, J. Tian, M. Gu. Material Leteers 57 (2002) 899.

Google Scholar