WO3 Thin Films Active in the IR Region

Katherine Sauvet; Laurent Sauques; Olivier Durand; Jacques Perrière; Jean Bernard Ledeuil; Danielle Gonbeau; Aline Rougier

doi:10.4028/www.scientific.net/AST.55.30

Paper Titles

Thermo-Optical Properties of Nd_0.3Sm_0.7NiO₃ Ceramic
p.7

(Sm_1-x,Ca_x)MnO₃ Ceramics with Tunable Emissivity
p.13

Symmetrical Electrochromic and Electroemissive Devices from Semi-Interpenetrating Polymer Networks
p.18

Electrochromic Nickel Oxide-Based Thin Films Deposited by Chemical Bath
p.24

WO₃ Thin Films Active in the IR Region
p.30

Proton-Induced Multiple Changes of the Absorption and Fluorescence Spectra of Amino-Aza-Oligo(Phenylenevinylene)s
p.36

Origin of the Difference in Phase Transition Behavior between TwoType of All-Organic Radical Liquid Crystals
p.42

Glass Microspherical Lasers
p.46

Structural and Spectroscopic Assessment of Er³⁺-Activated SiO₂-HfO₂ Glass Ceramics Planar Waveguides
p.56

HomeAdvances in Science and TechnologyAdvances in Science and Technology Vol. 55WO3 Thin Films Active in the IR Region

WO₃ Thin Films Active in the IR Region

Abstract:

This paper reports the enhancement of the electrochromic properties in the infrared, IR, region of radio frequency sputtered WO3 thin films thanks to a careful optimization of the deposition conditions. From the combination of various techniques of characterization, the optical performances, in particular, the contrast in reflectance between the inserted state and the deinserted one, upon cycling in H3PO4 liquid electrolyte, are correlated to the film morphology and composition. Films, grown in higher chamber pressure, exhibiting a lower density and a O/W ratio higher than 3, show the most promising behavior. Finally, first trends on the incorporation of the WO3 single layer in full electrochromic devices are discussed.