Influence of Substrate Temperature on Texture for Deposited TiNi Films

Abstract:

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In order to fabricate two-dimensional micro actuators with shape memory alloy films, it is especially important to evaluate the anisotropy of transformation strain that is caused by texture. In this paper, microstructures of sputter-deposited TiNi films are examined. The films of 1 μm in thickness are sputter-deposited on Si(001) substrates by RF magnetron multi-sputtering system equipped with four separate confocal sources as well as with substrate heating. Pure Ti and Ni targets of 50 mm in diameter are used for the sources. The films deposited at ambient temperature have been generally amorphous. However, we find that some films which are deposited at 773K of substrate temperature are crystalline, when we appropriately choose sputtering parameters such as source voltage and the distance between a target and the substrate. X-ray powder diffraction and pole figure measurements reveal that these films are oriented with {110}B2 parallel or inclined at 45 degree to the substrate. Furthermore, we also find that crystallized film is deposited even at 673K of substrate temperature by applying pulse bias voltage to the substrate.

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Periodical:

Edited by:

Pietro VINCENZINI and Stefano BESSEGHINI

Pages:

30-34

DOI:

10.4028/www.scientific.net/AST.59.30

Citation:

N. Ikenaga et al., "Influence of Substrate Temperature on Texture for Deposited TiNi Films", Advances in Science and Technology, Vol. 59, pp. 30-34, 2008

Online since:

September 2008

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$35.00

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