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Abstracts
Enhanced Solubility of Impurities and Enhanced Diffusion near to Crystal Surfaces
a.466
Many-Body Nature of the Meyer-Neldel Compensation Law for Diffusion
a.467
Brownian Motion in Crystals with Topological Defects
a.468
Regime Diagram for Plasma-Driven Hydrogen Transport through Metals
a.469
Electromigration, Realistic Electromigration Lifetime Projection for Very Large-Scale Integration Interconnects
a.470
Point Defects, On the Contribution of Interstitial Migration to Radiation-Induced Segregation in Face-Centered Cubic Binary Alloys
a.471
Positron Methods for the Study of Defects in Bulk Materials
a.472
On the Effect of Bulk Vacancy Diffusion upon the Shape of Sputtered Films
a.473
Dynamics and Micro-Mechanisms of the Early Stages of Rigid Indenter Penetration into the Surface of Ionic Crystals
a.474
HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 125-126Electromigration, Realistic Electromigration...

Electromigration, Realistic Electromigration Lifetime Projection for Very Large-Scale Integration Interconnects

Page: A470

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