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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 177-178

Defect and Diffusion Forum Vols. 177-178

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.177-178

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Table of Contents

Abstract Title Page

Si₃N₄: Stacking Faults

277

Si₃N₄: Surface Reconstruction

278

Si₃N₄/Si: Interface Defects

279

TaN: Cu Grain Boundary Diffusion

280

WSiN: Cu Diffusion

281

Ag₂O-TeO₂-AgI: Ionic Conduction

282

Al₂BeO₄, (Ga,Sc)₅Gd₃O₁₂: Dislocations

283

Al₄Bi₂O: Ionic Conduction and Point Defects

284

Al₂O₃: Cu, Fe, O Diffusion and Ion Implantation

285

Al₂O₃: H Diffusion and Point Defects

286