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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 203-205Limits of Ion-Beam Depth-Profiling as Used in...

Limits of Ion-Beam Depth-Profiling as Used in Diffusion Studies of Oxidation-Sensitive Materials

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Defects and Diffusion in Metals IV

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Periodical:

Defect and Diffusion Forum (Volumes 203-205)

Pages:

147-152

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.203-205.147

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Online since:

February 2002

Authors:

H. Ehmler, A. Rehmet, Klaus Rätzke, Franz Faupel

Keywords:

Depth-Profiling, Isotope Effect, Oxidation, Preferential Sputtering

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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