Limits of Ion-Beam Depth-Profiling as Used in Diffusion Studies of Oxidation-Sensitive Materials

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Periodical:

Defect and Diffusion Forum (Volumes 203-205)

Edited by:

D.J. Fisher

Pages:

147-152

DOI:

10.4028/www.scientific.net/DDF.203-205.147

Citation:

H. Ehmler et al., "Limits of Ion-Beam Depth-Profiling as Used in Diffusion Studies of Oxidation-Sensitive Materials", Defect and Diffusion Forum, Vols. 203-205, pp. 147-152, 2002

Online since:

February 2002

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