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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 216-217Solid-State Reactions in Ti/Ni Thin Film System on...

Solid-State Reactions in Ti/Ni Thin Film System on Silicon Single Crystal

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Diffusion, Segregation and Stresses in Materials

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Periodical:

Defect and Diffusion Forum (Volumes 216-217)

Pages:

263-268

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.216-217.263

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Online since:

February 2003

Authors:

Sergey I. Sidorenko, King-Ning Tu, Yu.N. Makogon, A. Csik, E.P. Pavlova, T.I. Verbitskaya, Yu.V. Nesterenko

Keywords:

Cross-Sectional Transmission Electron Microscopy, Nickel Monosilicide, Phase Transition, Thin Film System

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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