Paper Titles

Influence of the Grain Boundary Phase Transitions on the Diffusion-Related Properties
p.53

The Kirkendall Effect in Multiphase Interdiffusion
p.65

Deformation Phenomena Accompanying Internal Precipitation in Solids
p.73

Sensitive Magnetometric Method of the Diffusion Crystallization Study of Amorphous Alloys
p.77

The Influence of Stress on TiSi₂ Phase Formation
p.81

The Effect of Deformation on Structure and Properties of Surface Diffusion Layers Formed in Iron Alloys under Alloying by Nitrogen and Carbon
p.87

Grain Boundary Faceting Phase Transition and Thermal Grooving in Cu
p.93

Tracer Diffusion and Linear and Non-Linear Segregation in Cu Poly- and Bicrystals
p.101

Self-Diffusion Behavior of Nanocrystalline γ-FeNi
p.113

HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 216-217The Influence of Stress on TiSi2 Phase Formation

The Influence of Stress on TiSi₂ Phase Formation

Article Preview

Abstract:

You might also be interested in these eBooks

Diffusion, Segregation and Stresses in Materials

Info:

Periodical:

Defect and Diffusion Forum (Volumes 216-217)

Pages:

81-86

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.216-217.81

Citation:

Cite this paper

Online since:

February 2003

Authors:

M. Nkosi, C.C. Theron, O.M. Ndwandwe, R. Pretorius

Keywords:

Formation Kinetics, Stress, TiSi₂

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2003 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] F. La Via, S. Privitera, M.G. Grimaldi, E. Rimini, S. Quilici and F. Meinardi: Microel. Eng. Vol. 50 (2000), p.139

[2] H.S. de Waal, Ph.D. thesis (University of Stellenbosch, South Africa 1999).

[3] R.W. Mann, G.L. Miles, T.A. Knotts, D.W. Rakowski, L.A. Clevenger, J.M.E. Harper, F.M. D’Heurle and C. Cabral Jr.: Appl. Phys. Lett. Vol. 67 (1995), p.3729

[4] R.C. Cammarata, J.C. Bilello, A.L. Greer, K. Sieradzki and S.M. Yalisove: MRS Bulletin Vol. 24 No.2 (1999), p.34

DOI: 10.1557/s0883769400051526

[5] S.L. Cheng, H.Y. Huang, Y.C. Peng, L.J. Chen, B.Y. Tsui, C.J. Tsai and S.S. Guo: Appl. Phys. Lett. Vol. 74 (1999), p.1406

[6] A.I. Barg, B.S. Bokstein and L.M. Klinger: J. Appl. Phys. Vol. 72 (1992), p.1356

[7] L.R. Doolittle: Nucl. Instr. Meth. B Vol. B9 (1985), p.344

[8] A.P. Botha and R. Pretorius: Thin Solid Films Vol. 93 (1982), p.127

[9] W.K. Chu, S.S. Lau, J.W. Mayer, H. Müller and K.N. Tu: Thin Solid Films Vol. 25 (1975), p.393

[10] C.A. Pico and M.G. Lagally: J. Appl. Phys. Vol. 64 (1988), p.4957 Dr. M.M. Nkosi