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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 237-240Sb Diffusion and Segregation in Amorphous Si Thin...

Sb Diffusion and Segregation in Amorphous Si Thin Films

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Diffusion in Materials - DIMAT2004

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Periodical:

Defect and Diffusion Forum (Volumes 237-240)

Pages:

1246-1251

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.237-240.1246

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Online since:

April 2005

Authors:

G. Lanza, J. Nyéki, Christophe Girardeaux, Z. Erdélyi, A. Csik, Lajos Daróczi, G.A. Langer, Dezső L. Beke, Andree Rolland, Jean Bernardini, G. Erdélyi

Keywords:

Amorphous Si, Auger Electron Spectroscopy (AES), Nanoscale Diffusion, Segregation, Surface Segregation Kinetics, Thin Film

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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