Which is Larger, a Self-Interstitial or a Vacancy Activation Energy of Diffusion in Silicon?

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Periodical:

Defect and Diffusion Forum (Volumes 237-240)

Edited by:

M. Danielewski, R. Filipek, R. Kozubski, W. Kucza, P. Zieba, Z. Zurek

Pages:

181-188

DOI:

10.4028/www.scientific.net/DDF.237-240.181

Citation:

T. Okino et al., "Which is Larger, a Self-Interstitial or a Vacancy Activation Energy of Diffusion in Silicon?", Defect and Diffusion Forum, Vols. 237-240, pp. 181-188, 2005

Online since:

April 2005

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$35.00

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