Point Defects Characterization in Quenched δ-Ni2Si as Deduced from Isothermal Magnetic Susceptibility Measurements

Adib Jennane; O. Sassi; J. Aride; Jean Bernardini; Gérard Moya

doi:10.4028/www.scientific.net/DDF.273-276.312

Paper Titles

Measurement of Aluminium Oxide-Film Thickness: Barrier Oxide Film and Oxide Porous Layer
p.283

Diffusion Brazing of Single Crystalline Nickel Base Superalloys Using Boron Free Nickel Base Braze Alloys
p.294

Effects of Mg Additions on Surface Morphology and Corrosion Resistance of Hot-Dipped Zn Coatings
p.300

Determination of Concentration Dependent Diffusion Coefficients of Carbon in Expanded Austenite
p.306

Point Defects Characterization in Quenched δ-Ni₂Si as Deduced from Isothermal Magnetic Susceptibility Measurements
p.312

Growth Kinetics of Fe Boride Layers: Application of a Diffusion Model
p.318

Application of Artificial Neural Network for Prediction of Heat Treated Sintered Steels Properties
p.323

Prediction of Martensite Formation Start Temperature in Steels Using Artificial Neural Networks
p.329

Austenite Formation Temperature Prediction in Steels Using an Artificial Neural Network
p.335

HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 273-276Point Defects Characterization in Quenched δ-Ni2Si...

Point Defects Characterization in Quenched δ-Ni₂Si as Deduced from Isothermal Magnetic Susceptibility Measurements

Abstract:

The behaviour of quenched defects in Ni2Si compound is studied by isothermal susceptibility magnetic measurements. In the range of temperature 553-593K, where an enhancement of susceptibility has been previously detected by isochronal measurements, an activation energy (EA=2.5 ± 0.2 eV) is determined. This value is in agreement with the break-up of 3D nickel vacancy clusters, formed at lower temperatures, and the subsequent formation of nickel rich defects via the released vacancies.